SPUTTERING
TARGETS Sputtering targets are used to
produce thin films of metals or
compounds. A source material is
bombarded with plasma ions that
dislodge atoms from the surface
of the target. The ejected atoms
then deposit atop a substrate to
form a film coating that is several
atomic layers thick.
The flat panel display industry,
as well as all other coating industries,
requires a material which is conductive
and transparent. Indium, when sputtered
or evaporated, exhibits such properties
and is an excellent material for
meeting those requirements. AIM
can provide Indium and Indium/Tin
products in both a sputtering target
form or as an evaporation source.
Another
requirement of the targeting
industry is the ability to bond
a target material to a backing
plate prior to the sputtering process.
Indium’s unique properties
lend itself to be an excellent
bonding glue for this application.
AIM offers pure Indium in bar form
for your convenience.
Click here for additional information
on our ITO Sputtering Targets.
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